化学气相沉积法(chemical vapor deposition method,CVD) 是一种在低压下生长金刚石(钻石)的新方法.即用加热、放电等方法激活碳基气体(如甲烷),使之离解出碳...
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chemical vapor deposition method 化学气相淀积工艺 ; 化学蒸汽沉积法 ; 化学气相沉积法 ; 化学蒸气沉淀法 thermal chemical vapor deposition 热化学气相沉积 ; 热解化学气相沉积 ; 热化学气相沉积法 ; 热化学气相淀积 ..
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catalytic chemical vapor deposition method 催化化学蒸汽沉积法
chemical vapor deposition method pcvd 化学蒸汽沉积法
plasma chemical vapor deposition method 等离子体化学气相沉积法
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。
Carbon nanotubes filled with metal were synthesized through chemical vapor deposition method, and the structure were studied by electron microscopy.
本文系统介绍了金属填充碳纳米管的化学气相沉积制备与电子显微学研究。
Finally, annealing process is carried out in the electroplated metal layer formed by the electroplating process through chemical vapor deposition method under promotion of ammonia plasma.
之后，利用氨气等离子体促进化学气相沉积法对上述经电镀制程而形成的电镀金属层进行退火处理。
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