chemical vapor deposition passivation
chemical vapor deposition passivation
化学气相沉积钝化
以上为机器翻译结果，长、整句建议使用 人工翻译 。
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A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
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