... cleaning by dry process 干法净化 cleaning by wet process 湿法净化 cleaning doctor (除污)刮刀 ...
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cleaning by wet process
湿法清洗
以上为机器翻译结果,长、整句建议使用 人工翻译 。
A quantitative mechanism of particle removal from silicon wafer surfaces by wet chemical cleaning process was proposed.
对化学法清洗硅片过程中消除颗粒的机理作了定量的探讨。
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