The effect of anneal on the GMR of co ion implantation discontinuous multilayer films is greater than that of without ion implantation films.
退火对离子注入后的非连续多层膜gmr效应的影响比未注入离子的非连续多层膜gmr效应的影响显著。
To achieve co-implantation without additional ion sources, the required implants are mixed to form a cathode of MEVVA ion source.
将不同单质机械混合，在不增加注入机离子源数目的基础上实现了不同离子的共注入。
应用推荐