alumina crystal substrate 氧化铝瓷基片
crystal silicon substrate 单晶硅衬底
substrate crystal 衬底晶体
single crystal MgO substrate 单晶MgO基片
Method of surface treatment, crystal substrate, and semiconductor device.
表面处理方法，晶体基材，和半导体设备。
Thus, the semi-insulating nitride semiconductor crystal substrate in which warpage is less and cracking is less likely can be obtained.
由此，能获得其中翘曲较少且较不可能发生破裂的半绝缘氮化物半导体晶体衬底。
The surface smoothness of the single crystal substrate will be the most important factor, which influences the quality of the epitaxial film growth.
单晶基片的表面光洁度指标是影响后续薄膜生长质量的重要因素。
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