It has a fast deposition rate and surface cleaning features, in particular strong adhesion with the film, diffraction, and can be coated material widely and so on.
它具有沉积速度快和表面清洁的特点，特别具有膜层附着力强、绕射性好、可镀材料广泛等优点。
The influences of the sputtering power on deposition rate, film structure, and contact performance of the film prepared on CdZnTe substrate have been investigated.
系统地研究了溅射功率对沉积速率、薄膜结构、组织形貌及接触性能的影响。
High ionization rate, full reaction, pure film color, fast deposition.
离化率高，膜层反应充分，使膜层颜色纯正，沉积速度快。
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