• 氟化非晶态碳膜 - 引用次数：3

  In this paper, three series of fluorinated amorphous carbon films with different fluorine to carbon were fabricated by plasma enhanced chemical vapor deposition (PECVD) and by plasma immersion ion implantation and deposition (PIII-D).

  本文采用等离子体增强化学气相沉积(PECVD)和等离子体浸没离子注入与沉积(PⅢ-D)工艺，合成出了氟碳比不同的三个系列氟化非晶态碳膜。

  参考来源 - 氟化非晶态碳膜的制备及其性能研究
• 氟化非晶碳膜 - 引用次数：2

  Fluorinated amorphous carbon films have been deposited in microwave electron cyclotron resonance plasma chemical vapor deposition (ECR-CVD) system using CF4 and C6H6 as sources gases. The films as-deposited were annealed in vacuum.

  用C_6H_6和CF_4作为源气体，在微波电子回旋共振等离子体化学气相沉积系统中(ECR-CVD)，制备了氟化非晶碳膜(a-C:F,H膜)，并对其进行真空退火处理。

  参考来源 - 微波功率和真空退火对a

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