...膜形成金属薄膜层的方法，可以无限制地使用镀敷法、真空蒸镀法、溅射法、离子镀敷法、离子化蒸镀法、离子簇束(ion cluster beam)沉积法等公知的方法。另外，该金属薄膜层的厚度优选为10 500nm，从性价比方面考虑更优选为50 200nm。
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The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
In order to understand the generating process, an hydromechanics analysis is given. The gas cluster ion beam apparaturs is studied for engineering applications.
为搞清气体团束的产生过程，进行了流体力学分析。
The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.
气体离化团束优良的平坦化和清洁化效果可能与照射中多体碰撞、侧向溅射及高能量密度的沉积相关。
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