Large beam low-energy Implantation 大束流低能注入
low energy ion implantation 低能离子注入
low energy ions implantation 低能离子注入
ultra-low energy ion implantation 超低能离子注入
plasma-based low-energy ion implantation 等离子体基低能离子注入
The fabrication of modern semiconducting integrated circuits often requires implantation steps that involve high currents of low-energy charged dopant atoms.
现代半导体集成电路的制造往往要求涉及大电流低能量带电搀杂剂原子的注入步骤。
An implanter without ion mass analyzer was used to fabricate thin SOI materials by low energy and low dose water ions implantation instead of conventional SIMOX.
采用无质量分析器的离子注入机，以低能量低剂量注水的方式代替常规SIMOX注氧制备soi材料。
Effect of wheat's POD treated with vacuum in the process of low energy ion beam implantation was researched.
研究了低能离子束注入过程中真空对小麦过氧化物酶同工酶的影响。
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