The content of oxygen in the film that is deposited by using pulsed PCVD is evidencely low. This is helpful to deposit films with low surface energy for us.
在脉冲PCVD法制备的薄膜中，氧的含量降低得多，这一结果对于我们制备低表面能薄膜是非常有意义的。
The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition.
脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。
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