The normal grain growth during continuous cooling was studied in a single-phase material after recrystallizing.

探讨了单相合金高温形变再结晶后连续冷却条件下正常晶粒长大问题。

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A simple theory analysis is presented for grain growth (normal grain growth and abnormal grain growth) and the texture change of thin films.

对薄膜中晶粒生长(正常晶粒生长和异常晶粒生长)和织构变化进行了简单的理论分析。

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The original (111) and (200) double fibre texture still exist at low temperature grain growth stage, but diminish gradually at normal grain growth stage.

原始镍镀层的(111)和(200)面双织构在低温晶粒异常长大阶段仍存在，但在正常长大阶段逐渐消失。

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