preparation of semiconductor thin film 半导体薄膜材料制备
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Several methods of the preparation of ITO thin film with sol-gel technique were introduced. The ITO thin films were gotten by the inorganic method.
介绍了几种用溶胶凝胶法制备ito薄膜的工艺方法，用其中一种无机的方法成功制备了ITO透明导电膜。
The preparation, structure characteristics and photoelectricity characteristics of the nanometer silicon thin film and nanometer silicon thin film solar cells was reviewed.
综述了纳米硅薄膜及纳米硅薄膜太阳电池的制备方法、结构特性、光电特性等，显示出其有重要的应用前景。
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