射频磁控反应溅射
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reactive radio-frequency magnetron sputtering 反应磁控溅射
reactive radio frequency magnetron sputtering 反应射频磁控溅射
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HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
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