物理气相沉积是多种溅射 技术的通称, 它包括射频溅射 ( radio frequency sputtering) 、直流反应磁控溅射 ( reactively direct current magnetron sputtering , RDCMS) 和粒子束增强沉 积(ion2beam2assisted deposi...
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•溅射法依不同能源，可分射频溅射法(radio frequency sputtering)及 直流磁控溅射法 ( DC magnetron sputtering )。 •利用射频溅射技术可获得稀土金属氟化合物(REMF)-MoS 2 -Au 多 层奈米薄膜。
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Radio-Frequency Sputtering System 射频磁控溅镀系统
radio frequency sputtering deposition 射频溅射沉积
Radio frequency-magnetro sputtering 用射频磁控溅射 ; 利用射频磁控溅射
Radio-frequency magnetron sputtering 用射频磁控溅射法 ; 磁控溅射
radio frequency magnetron sputtering method 射频磁控溅射法
Radio-Frequency magnetron sputtering system 控溅渡系统
The results of XRD showed that the D. C. reactive sputtering ZrN films were mainly amorphous and the radio frequency sputtering ZrN films were mainly crystalline.
X射线衍射分析表明,直流溅射法制备的氮化锆薄膜一般为非晶,而射频溅射法制备的氮化锆薄膜为晶态。
参考来源 - 口腔材料表面氮化锆薄膜制备工艺与性能·2,447,543篇论文数据，部分数据来源于NoteExpress
CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS, XRD and FTIR.
采用射频磁控溅射法沉积了CN薄膜，利用XPS, XRD, FTIR等测试手段研究了CN薄膜的成分和结构。
HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
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