Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
The results show that the vapour pressure and the mass loss rate of tantalum propoxide, tantalum butoxide and niobium ethoxide are suited for chemical vapor deposition.
结果表明，丙醇钽、丁醇钽和乙醇铌的蒸汽压大小能够满足化学气相沉积的要求，有足够的挥发速率。
Rate Saturation in laser chemical vapor deposition of W and Pt films by photolysis or pyrolysis with the increase of the light intensity have been observed.
本文报道在光解沉积钨膜和光致热分解沉积铂膜中观察到沉积速率随光强饱和现象。
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