thermal sulfurizing 硫化处理
organic sulfurizing agent 有机硫化剂
Sulfurizing Reagent 渗硫试剂
ion-sulfurizing 离子渗硫
liquid sulfurizing 盐液渗硫
The film was sulfurized by the precursor Mo/Ti film with the content of 16.95 at. % Ti had the most compact microstructure and the lowest friction coefficient under the same sulfurizing condition.
在相同硫化条件下,由Ti含量为16.95at.%的Mo/Ti前驱体制备的Mo硫化物/Ti复合薄膜具有最低的摩擦系数,说明适量的Ti可以改善其摩擦性能。
参考来源 - WS·2,447,543篇论文数据,部分数据来源于NoteExpress
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