非平衡磁控溅射(unbalanced magnetron sputtering,UBMS)技术作为一种新型的技术,通过附加的磁场,使阴极靶面的等离子体状态发生较大改变,从而不仅具有普通磁控溅...
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研究结果表明：1)采用非平衡磁控溅射(Unbalanced Magnetron Sputtering, UBMS)技术沉积DLC膜时,靶电流对界面层厚度的影响占主导地位；当靶基距从102mm增至162mm时,薄膜界...
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Closed-field unbalanced magnetron sputtering 闭合场非平衡磁控溅射
ecr unbalanced magnetron sputtering ecr非平衡磁控溅射
unbalanced magnetron sputtering system 非平衡磁控溅射系统
unbalanced magnetron sputtering deposition 非平衡磁控溅射
plasma enhanced unbalanced magnetron sputtering 等离子体增强非平衡磁控溅射
intermediate frequency unbalanced magnetron sputtering 中频磁控溅射
unbalanced reactive magnetron sputtering 非平衡反应磁控溅射
unbalanced magnetron reactive sputtering 非平衡磁控反应溅射
In this paper Ti/TiN multilayer films with periods from 100nm to 350nm were synthesized by unbalanced magnetron sputtering.
本文采用非平衡磁控溅射技术制备了100nm～350nm调制周期的Ti／TiN多层薄膜。
参考来源 - TiThere is a biggish working chamber in closed-field unbalanced magnetron sputtering deposition system, and it’s very possible for substrate-placed position to affect the quality of coatings markedly.
闭合场非平衡磁控溅射镀膜设备真空腔尺寸较大,工位很有可能显著影响镀层的质量。
参考来源 - 靶基相对位置对C/Cr复合镀层性能和组织结构的影响·2,447,543篇论文数据，部分数据来源于NoteExpress
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