... ion beam printing 离子束刻蚀法 ion beam sputtering 离子束溅射 ion beam technology 离子束工艺 ...
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ion beam sputtering system 离子束溅镀系统 ; 离子束微影术
reactive ion-beam sputtering 反应离子束溅射
ion beam sputtering technology 离子束溅射技术
Dual-ion beam sputtering deposition 双离子束溅射淀积
dual ion beam sputtering 双离子束测射
dual-ion beam sputtering 双离子束溅射
ion beam sputtering method 离子束溅射法
double-ion beam sputtering 双离子束溅射
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.
在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善DLC膜的性质有重要意义。
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