Large beam low-energy Implantation 大束流低能注入
low-energy implantation 低能离子注入
low energy ion implantation 低能离子注入
low energy ions implantation 低能离子注入
ultra-low energy ion implantation 超低能离子注入
plasma-based low-energy ion implantation 等离子体基低能离子注入
The fabrication of modern semiconducting integrated circuits often requires implantation steps that involve high currents of low-energy charged dopant atoms.
现代半导体集成电路的制造往往要求涉及大电流低能量带电搀杂剂原子的注入步骤。
An implanter without ion mass analyzer was used to fabricate thin SOI materials by low energy and low dose water ions implantation instead of conventional SIMOX.
采用无质量分析器的离子注入机，以低能量低剂量注水的方式代替常规SIMOX注氧制备soi材料。
However, the discovery of bioeffects induced by ion beam implantation has opened a new branch in the field of ion beam applications in the life science-low-energy Heavy ion Biology.
离子注入生物效应的发现开拓了低能离子束技术在生物学中应用的新领域，形成了一个新的交叉学科——低能重离子生物学。
应用推荐