sub-half micron lithography 亚半微米光刻
Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.
用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。
The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced.
主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
Deep? Sub? Micron optical lithography process is facing more and more serious challenge.
深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。
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