This paper mainly deals with the relationship between negative bias of substrate and component phases of magnetron-sputtering ion plated aluminium film of A3 steel.
本文主要论述基板负偏压与A 3钢基体磁控溅射离子镀铝膜相组成的关系。
Ions sputtering could lead to the decrease of the thickness when the substrate negative bias voltage increases excessively.
负偏压过大对吸附离子产生反溅射作用导致涂层厚度减小。
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