本文分别用原子力显微镜、双束紫外可见分光光度计、X-衍射仪等表征了用以上两种方法制备的三氧化钨薄膜。
The tungsten oxide films by two methods were characterized by atomic force microscope, double-beam UV-VIS-NIR spectrophotometer and X-diffractometer.
本文采用反应磁控溅射法和溶胶凝胶法制备了均匀致密的三氧化钨薄膜材料，对它的光学性质、表面形态、结构等进行了深入的研究。
The effects of low-power(LP) buffers on the structural properties of ZnO thin films deposited under high power by RF magnetron sputtering have been investigated.
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