• 测试发现暴露在一定程度上降低抛光试样表面残余压应力水平。

    Compared with the polished specimens, the surface residual stress of the post-exposed specimens was also compressive, but much lower.

    youdao

  • 测试发现暴露在一定程度上降低抛光试样表面残余压应力水平。

    Compared with the polished specimens, the surface residual stress of the post-exposed specimens was also compressive, but much lower.

    youdao

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