A simple dynamic chemical etching device based on siphon principle is developed for fabrication of optical fiber probes which are commonly used in near-field optical microscopy.
基于虹吸原理，设计了一种动态化学腐蚀法的简易装置，用于制备近场光学显微镜光纤探针。
The mechanism of the chemical etching is discussed.
并对可能的腐蚀机理进行了探讨。
Furthermore, the mechanism of the chemical etching has been discussed.
并对可能的腐蚀机理进行了探讨。
The crystal defects were studied by optical method and chemical etching method.
用光学法和化学腐蚀法研究了晶体的缺陷，并分析了缺陷成因。
The chemical etching was an effective way for relieving of machining residual stress.
化学蚀刻是消除铍材机加应力的有效方法。
Stencil manufacturing techniques include chemical etching laser cutting and electroforming.
钢网制作技术包括化学腐蚀，激光切割和电铸。
The twins in NYAB and NGAB crystals were investigated by synchrotron radiation topography and chemical etching method.
采用同步辐射形貌术结合化学腐蚀法，系统研究了NYAB和NGAB晶体中的孪晶结构。
Characterization method of defects in silicon carbide by chemical etching and optimal process parameters are obtained.
论文得到了用腐蚀法表征碳化硅材料缺陷的方法和优化的工艺参数。
The shape, distribution and density of etch pits on the (101) face was observed by metalloscope after chemical etching.
单晶，通过化学腐蚀和金相显微镜研究了（101）晶面蚀坑的形貌、分布特征及其密度的大小。
The technics of chemical etching, chemical polishing and chromium electroplating for stainless steel mould were studied.
研究了不锈钢模具板的化学蚀刻、化学抛光和电镀铬工艺。
This paper investigated the law of KPB crystal twinning using microcrystallography, chemical etching and optical method.
本文采用显微结晶、化学浸蚀和光学方法研究了KPB晶体的孪生规律。
Different technologies are available to directly mark objects: laser / chemical etching, dot peening and ink jet printing.
不同的技术可帮助实现此直接印刻的工艺，如激光/化学雕刻、点式打标和喷码打印技术。
The chemical etching condition of CR-39 solid state nuclear track detector for neutron measurement was optimized by experiment.
通过实验确定了CR - 39固体核径迹探测器用于中子测量的化学蚀刻条件。
The mechanism and process of fabricating fiber probe by combining the static and dynamical chemical etching methods is analyzed.
理论上分析了静动结合的化学腐蚀法制备探针的具体机理及过程。
The chemical etching method wa applied to form surface texture of multicrystalline silicon in order to reduce the reflectance of the surface.
为了降低光在多晶硅表面的反射，采用化学腐蚀法在其表面制备了绒面。
In the processing of the mold texture, the traditional chemical etching exits the shortcomings of the pollution and the long processing cycle.
在模具纹路加工中，传统的化学蚀刻方法存在污染大、加工周期长的缺点。
The technics can been applied to surface treatment of chemical etching, chemical polishing and chromium electroplating for different kinds of stainless steel.
该工艺可以用于各种类型不锈钢的化学蚀刻、化学抛光和电镀铬处理。
The crystal was characterized by four-crystal X-ray diffraction, chemical etching, optical microscope, transmission spectra and atomic force microscope (AFM).
通过四晶X射线衍射、化学腐蚀、光学显微、透过光谱以及原子力显微镜对晶体的质量进行了表征。
Wet chemical etching of sacrificial layers plays an important part in fabricating movable tree-dimensional micromachines by combination with MEMS technologies.
牺牲层腐蚀技术结合MEMS技术是制作三维可动微机构的一个重要加工手段。
The affections of different surface treatments by mechanical polishing, chemical etching and photoetching to the properties of electrodes have also been discussed.
探讨了机械抛光、化学抛光和光抛光等不同表面处理方法对电极特性的影响。
By observing and analyzing the formation of PPS with chemical etching, a new model of PPS formation was proposed: inverse crystallography model of PPS formation process.
通过观察和分析多晶多孔硅化学腐蚀机理提出了一个新模型：多孔硅形成机理的逆结晶学模型。
This paper introduces a fabricated method of using fused silica as the chip material. It includes standard photolithography, wet chemical etching and bonding techniques.
本文介绍了选用优质石英为芯片基体材料的一种制作方法，关键技术包括标准的光刻，湿法腐蚀，键合等微加工技术。
The surfaces of the sample are decontaminated effectively first by chemical etching and then by heating directly in a stream of oxygen after placing sample on loading arm.
先经化学腐蚀再在试样臂上用纯氧加热可以有效地消除试样的表面沾污。
According to the hydraulic transmission principle, a device for fabricating large cone Angle near-field optical fiber probe by means of dynamic chemical etching is developed.
基于液压传递原理，设计出一种用动态化学腐蚀法制备大锥角近场光纤探针的装置。
The distribution of residual stress along depth gained through layer-by-layer measuring method after chemical etching is in line with that measured by multi-wavelength method.
化学蚀刻后逐层测试所得应力沿深度分布与用多波长法测试结果趋势一致，大小略有差异。
Probes of various structures, such as large cone angle and short taper or multi-taper, can be formed with the combination of the static and dynamical chemical etching methods.
利用此法可制备出尖端锐利、大锥角或多锥体等各种结构的光纤探针。
In order to reduce the thermal conductivity and heating capacity and increase the detectivity of array, the suspended structure was formed on silicon wafer by chemical etching of KOH.
为了降低热导和热容，提高探测器的探测灵敏度，用KOH作化学腐蚀完全去除了线性阵列下方的硅衬底，形成悬空结构。
In view oi the problems existing in the silicon micro pressure sensors, this paper proposes the chemical etching techniques and the selective etching processes to control diaphragm thickness.
并针对硅微压传感元件研制中存在的问题，提出采用化学腐蚀技术，选择性腐蚀工艺控制膜厚。
Chemical etching and high temperature heating were used for pretreatment of substrates.
衬底预处理采用化学刻蚀和高温处理。
Chemical etching and high temperature heating were used for pretreatment of substrates.
衬底预处理采用化学刻蚀和高温处理。
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