A method for improving the critical dimension uniformity of a patterned feature on a wafer in semiconductor and mask fabrication is provided.
一种在半导体与罩幕制造中改善晶圆上的图案化特征结构的临界尺寸均匀性的方法。
Using CTQ (Critical to Quality, critical dimension/items check list) for critical parts to check 1st batch parts from local supplier before ramp up build.
在爬坡生产前使用关键部品的关键尺寸或条目检查表来检查本地供应商递交的第一批部品。
Critical Dimension Correction.
临界尺寸改正。
Critical Dimension Correction.
临界尺寸改正。
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