The magnetron-sputtering ion plating aluminum film is not simply an out- covering layer of a single substance, but an alloy film containing both aluminum and copper.
磁控溅射离子镀铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field.
本实用新型涉及薄膜制备领域，具体地说是一种新型的改善电弧离子镀沉积工艺的动态磁控弧源装置。
The factors of Influence on the quality of coated film were analysed, the application of multi-arc ion plating in ornament film has good prospects.
分析了影响膜层质量的因素。 结果表明．这种技术在装饰膜方面有很好的应用发展前景。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
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