Using 193-nm with double patterning will force chip makers to use "more restrictive design rules," he said.

因为193 nm液浸式光刻技术与双重成像的结合将迫使芯片产商对芯片设计准则设置更多的限制。

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Using 193-nm with double patterning will force chip makers to use "more restrictive design rules," he said.

因为193 nm液浸式光刻技术与双重成像的结合将迫使芯片产商对芯片设计准则设置更多的限制。

youdao