The sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 100.
离化团束的溅射产额比之单体离子束高100倍以上。
When the incident energy is higher than the threshold energy, however, the sputtering yield increases with the increase of the incident energy.
当入射原子的能量大于溅射阈值时，溅射产额随入射原子能量的增加而线性增大；
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
It is found that the sputtering yield of kinetic impact is increased by HCIs and the potential sputtering (PS) could be induced by impact of HCIs.
实验结果表明高电荷态离子能够增加动能溅射；同时高电荷态离子入射能够引起势能溅射。
It is found that the sputtering yield of kinetic impaction is increased by HCIs and the potential sputtering (PS) could be induced by impaction of HCIs.
实验结果表明高电荷态离子能够增加动能溅射；同时高电荷态离子入射能够引起势能溅射。
It is found that the sputtering yield of kinetic impaction is increased by HCIs and the potential sputtering (PS) could be induced by impaction of HCIs.
实验结果表明高电荷态离子能够增加动能溅射；同时高电荷态离子入射能够引起势能溅射。
应用推荐