Slurry performance for CMP can be determined by several output parameters including removal rate, global planarity and surface defect.
抛光液的优劣主要有抛光率,平坦性以及缺陷的数量等几个参数反应。
Slurry performance for CMP can be determined by several output parameters including removal rate, global planarity and surface defect.
抛光液的优劣主要有抛光率,平坦性以及缺陷的数量等几个参数反应。
应用推荐