The fabrication of X-ray stencil silicon mask and its application in X-ray deep lithography are presented in this paper.
阐述了X射线镂空硅掩模的研制及其在同步辐射深层光刻中的应用。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
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