The nanometer tin powders were prepared by DC arc plasma evaporation method using a self-designed and fabricated apparatus.
采用高纯锡，通过自行设计的直流电弧等离子体蒸发设备制备了纯净的纳米锡粉。
The pure nickel nanopowders were prepared by DC arc plasma evaporation method using self-designed and fabricated experimental apparatus.
采用自行研制的试验装置，用直流电弧等离子体蒸发法制备了高纯度的纳米镍粉。
Diamond film wafers with different thickness were prepared by high power DC arc plasma jet CVD method.
采用高功率直流电弧等离子体cvd工艺制备了不同厚度的无裂纹自支撑金刚石厚膜。
Diamond film wafers with different thickness were prepared by high power DC arc plasma jet CVD method.
采用高功率直流电弧等离子体cvd工艺制备了不同厚度的无裂纹自支撑金刚石厚膜。
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