Laser lithography is one of the main methods for manufacturing micro-optical and the binary optical masks.
激光光刻是加工微光学及二元光学掩模的主要手段。
To improve the fabrication technology of photoelectrical encoder, the laser lithography method was introduced.
为了改进光电码盘的制作工艺，提高效率，降低成本，提出了一种光电码盘的光刻方法。
The smallest linewidth produced by laser lithography plays an important role in the properties of the micro-optical elements.
光刻的最细线宽对所加工的二元微器件性能起决定作用。
The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron - beam Lithography Machine.
正在研制的激光定位吊装结构工作台系统是电子束曝光机的主要组成部分。
Experimental results of deep submicron lithography with a excimer laser are reported in this paper.
报道用远紫外准分子激光进行亚微米光刻的实验结果。
It can make up the shortage that only the periodic dots or lines can be made when using laser standing wave field to control the atoms to stack on wafer in atom lithography.
弥补了原子光刻技术中利用激光驻波场控制原子堆积只能制作单一量子点、线等周期性图形的不足。
In the BOE laser direct-writing device, the adjusting effect of spindle velocity is one of the key factors for determining the lithography effectiveness and accuracy.
在二元光学元件激光直写设备中，主轴速度调节效果的好坏是决定刻划效率与精度的关键因素之一。
Third, laser crystals emitting at UV and visible regions for color displaying and optical lithography.
面向全色显示、光刻等应用的蓝绿紫和可见光激光晶体；
The lithography technique to fabricate the curved microlens array on the curved substrate by using laser direct writing system was also given.
文中给出了用激光直写设备在曲面基底上进行光刻来制作曲面微透镜阵列的方法。
Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.
描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。
Microfabrication of periodic structures by holographic lithography technology combining with visible laser-induce photopolymerization is developed in this paper.
本文报道用激光全息技术结合可见光光聚合制作周期结构的方法和物理机制；
In chapter four, the system design of Laser LIGA Lithography Apparatus and unit design are introduced.
第四章介绍了激光LIGA光刻实验装置的总体设计以及各单元部件的研制情况。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
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