• The deposited metal also can be doped with platinum, tungsten or molybdenum, etc.

    沉积金属时可以掺入

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  • Deposited metal fluidity better than 308l, on weld the operation too more superior.

    熔敷金属流动性308l为佳焊接操作优越

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  • The microscopic analysis results indicate that deposited metal is hypereutectic structure.

    测试结果表明熔敷金属为过晶组织。

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  • Dissolve deposited metal has low hardness and high toughness, heat corrosion resistance to impact abrasion.

    金属具有硬度韧性可耐热腐蚀冲击磨耗。

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  • Submerged arc welding with the test welding wire matching sintered flux was carried out to get the deposited metal.

    对所研制的焊丝匹配烧结焊剂进行熔敷金属弧焊试验

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  • By adding magnesium powder into the coating of electrode, the sulphurs removal in deposited metal was satisfactory.

    通过理论分析及实验,探讨手工电弧焊焊条药皮中添加金属脱硫效果。

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  • The transition coefficients of alloying from cored wire to deposited metal during CO2 GMAW have been studied in this paper.

    研究焊丝CO2保护电弧堆焊过程合金元素过渡系数

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  • Deposited metal of martensite with high hardness, good abrasion resistance, impact resistant performance of hardness HRC55 ~ 58.

    熔敷金属具有硬度马氏体组织耐磨耗冲击性能优良,硬度HRC55 ~58

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  • The results show that cobalt-based dies deposited metal has especially significant impact strengthening under high temperature impact.

    试验结果表明钴基模具堆焊金属具有较显著冲击强化效果,尤其是高温冲击强化效果。

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  • The microstructure of the deposited metal and the effect of the welding heat input on the formation of the deposited metal are studied.

    分析堆焊金属显微组织,研究了焊接线能量对堆焊层金属显微组织形成影响

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  • When using the aluminium contained steel sheath, the harmf of aluminum to the properties of deposited metal can be limited to some extent.

    采用带制造自保护药芯焊丝充分发挥有利作用,同时减少熔金属中残留铝含量及性能的不利影响。

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  • The deposited metal has excellent mechanical properties. It is used for welding middle-carbon and low-alloy steel structure, such as pressure containers, bridges, and ship structure.

    金属力学性能优良用于中碳钢合金钢重要结构的焊接,压力容器桥梁船舶结构。

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  • In this paper, using alkanethiol self_assembled monolayers (SAMs) on gold as model interface, the behavior of deposited metal on SAMs surface and the interaction mechanism were analyzed.

    本文介绍了金属原子烷基硫醇自组装分子表面沉积行为,从理论上分析了其作用机理,归纳出了金属在自组装单层膜表面的再沉积规律。

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  • In this paper, using alkanethiol self_assembled monolayers (SAMs) on gold as model interface, the behavior of deposited metal on SAMs surface and the interaction mechanism were analyzed.

    本文介绍了金属原子 烷基硫醇自组装分子表面沉积行为,从理论上分析了其作用机理,归纳出了金属在自组装单层膜表面的再沉积规律。

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  • In the electroforming process, the anode electrode shape and position determine the current density distribution on the cathode and so the distribution and properties of the deposited metal.

    阳极形状位置决定阴极表面电流密度分布最终影响金属沉积层分布的均匀及其材料性能。

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  • A chelating agent that softens hard tap water by binding with dissolved metal ions, preventing them from being deposited as a yucky residue on your nice clean dishes.

    一种合剂,通过水中溶有的金属离子结合来软化硬质,这样这些水垢就不会残留好的干净盘子上了。

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  • As these films use less material they are cheaper to produce, not least because they can be deposited on bases like metal, glass and plastic.

    因为这些薄膜使用较少原料从而使得它们的生产成本更低同样重要,它们可以装配诸如金属玻璃塑料等基底之上

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  • The devices, invented by Cheshire-based company ATMOS, are made from a mixture of metal oxide coatings deposited onto common building materials such as concrete.

    设备基于CheshireATMOS公司发明,它可以将金属氧化物喷涂建筑材料(混凝土)表面。

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  • This solution can then be deposited onto a variety of materials, including flexible plastics or metal foils.

    这种溶液能够沉积各种材料之上,包括弯曲塑料物体或是金属箔片。

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  • It could also be applied to different types of graphene materials, including chemical vapour deposited (CVD) graphene films created on metal films.

    各种石墨材料适用比如化学气象沉积(CVD)金属层上生长石墨烯层。

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  • Electroplating is an electrochemical process by which metal is deposited on a substrate by passing a current through the bath.

    电镀种在电镀槽通上电流使金属基体上电化学过程

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  • In mechanical products using electrolysis deposited on attachment good, but the performance and substrate material of different metal coating technology.

    利用电解作用机械制品沉积出附着良好性能基体材料不同金属覆层技术

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  • In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.

    本文采用直流反应磁控溅射工艺,金属为靶材,玻璃单晶硅上沉积了WO 3薄膜

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  • The salt solution is to point to in the cathode can be deposited required of the metal coating the salt, used to provide a metal ions.

    镀液中能阴极上沉积出所要求镀层金属盐﹐用于提供金属离子。

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  • The base electrode (3) is a metal layer deposited on top of the semiconducting material forming the first electrode.

    基极电极(3)沉积形成第一电极半导体材料上面金属

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  • Using X-ray diffraction technique, the process of the crystal growth of metal ultrafine particles, which are prepared by sputtering method and deposited on the silica! Substrate, have been researched.

    利用X -射线衍射技术溅射沉积非晶二氧化硅基底上金属晶体超微生长特性进行实验研究。

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  • Using X-ray diffraction technique, the process of the crystal growth of metal ultrafine particles, which are prepared by sputtering method and deposited on the silica! Substrate, have been researched.

    利用X -射线衍射技术溅射沉积非晶二氧化硅基底上金属晶体超微生长特性进行实验研究。

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