• At last, the feasibility of fabricating light guide plate by double beam laser direct writing system is confirmed.

    最后论证用双光束激光直写系统制作亚微米光栅型导光板的可行性。

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  • Some binary optical elements were manufactured by parallel direct writing and inductive couple plasma etching technology.

    利用并行直写技术与感应耦合等离子刻蚀技术制作了部分二元光学元件。

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  • A new pinhole-focusing scheme using referenced defocus signal is applied to an automatic subsystem for laser direct writing.

    一种新的采用基准离焦信号的针孔调焦方案,用于激光直写的自动对焦子系统。

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  • The experimental exposure results on the laser direct writing system showed good agreements with the theoretical calculation.

    在激光直接写入系统上的曝光试验结果与理论计算相符。

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  • A model for compensation of radial shift was established to further improve fabrication precision during polar laser direct writing.

    为了进一步提高光学元件的线条制作精度,建立了极坐标激光直写时线条中心径向漂移的补偿模型。

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  • This paper summarizes the type, application advantage and tendency of direct writing technique in electronic industry.

    概述了在电子工业中直写技术的种类和应用优点与趋势。

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  • The lithography technique to fabricate the curved microlens array on the curved substrate by using laser direct writing system was also given.

    文中给出了用激光直写设备在曲面基底上进行光刻来制作曲面微透镜阵列的方法。

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  • The exposure dose distribution and line width control for the laser direct writing system are analyzed. Some experiments are also carried out.

    对激光直写光刻的曝光量分布和线宽控制进行了相关理论分析和实验。

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  • A linewidth stabilizing method for defocusing laser direct writing is proposed for further improvement of line quality of diffractive optical elements.

    为了提高激光直写加工衍射光学元件时的线条质量,提出一种离焦激光直写的线宽稳定方法。

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  • The results show that it is suitable to write azopolymer long-period optical fiber gratings using the polarization direct writing method and amplitude mask method.

    结果表明:目前比较适合用于偶氮苯聚合物长周期光纤光栅刻写的方法有偏振直写法和振幅掩模法两种。

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  • Laser direct writing system is the key equipment for fabrication of optical diffractive elements, and the defocus detection technique is the important sub-tech in it.

    激光直写机是制作衍射光学元件的关键设备,离焦检测技术是其中的重要单元技术之一。

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  • Femtosecond laser direct writing in transparent materials and the two-photon photopolymerization technology are used to fabricate the phase-gratings and Dammann grating.

    采用飞秒激光透明材料改性和飞秒激光双光子聚合技术制备了位相光栅和达曼光栅等微光学元件。

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  • Through to the encoder truth table characteristic analysis, has obtained the direct writing logical expression concrete method using the Karnaugh map most minor term merge rule.

    通过对编码器真值表的特点分析,利用卡诺图最小项合并规则得出了直接书写逻辑表达式的具体方法。

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  • DOE with high diffractive efficiency can be fabricated by laser aided fabrication technology LDWS (laser direct writing system), similar to the way manufacturing micro electronics.

    采用类似于微电子加工手段的激光辅助制造技术——激光直写技术,可以制作具有高衍射效率的DOE。

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  • The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.

    采用电子束直写、步进制模、压印翻制的压印模具生产工艺,其模具的制造是目前面临的难点。

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  • The laser direct writing(LDW) system SVGLDW 04 with a projection optical system and a spatial light modulator(LCD-SLM) can expose a reduction pattern directly on a photoresist plate.

    通过双远心成像光路,激光直写(LDW)系统SVG-LDW04把液晶空间光调制器(LCD-SLM)上的光斑直接成像在光刻胶板上,得到高质量的光斑图形。

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  • The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks.

    综述了二元光学元件的常用制作工艺技术,包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。

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  • In this paper, based on the technique of laser micro-fine cladding and flexibly direct writing, micro-fine conductive lines of high quality and high property are fabricated on glass substrates.

    设计了一种具有方形光斑的新型激光直写系统,用双远心投影透镜组获得方形光斑并以逐点光刻模式运行, 改善了衍射图形光刻质量, 提高了系统运行效率。

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  • In the BOE laser direct-writing device, the adjusting effect of spindle velocity is one of the key factors for determining the lithography effectiveness and accuracy.

    在二元光学元件激光直写设备中,主轴速度调节效果的好坏是决定刻划效率与精度的关键因素之一。

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  • In the BOE laser direct-writing device, the adjusting effect of spindle velocity is one of the key factors for determining the lithography effectiveness and accuracy.

    在二元光学元件激光直写设备中,主轴速度调节效果的好坏是决定刻划效率与精度的关键因素之一。

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