Arc ion plating or magnetron sputtering provides the best application condition for pulse technique.
电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。
ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.
摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field.
本实用新型涉及薄膜制备领域，具体地说是一种新型的改善电弧离子镀沉积工艺的动态磁控弧源装置。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
The ion plating is a new technique combined vacuum evaporation plating with sputtering.
离子镀是真空蒸镀与溅射相结合的新工艺。
The ion plating is a new technique combined vacuum evaporation plating with sputtering.
离子镀是真空蒸镀与溅射相结合的新工艺。
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