All samples were prepared by rf magnetron sputtering method.
所有样品采用射频辅助磁控溅射方法制备。
Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.
本文利用射频磁控溅射方法，在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
The invention relates to a magnetic confinement magnetron sputtering method and a magnetron sputtering device prepared by use of the same.
本发明涉及一种磁约束磁控溅射方法及利用该方法制备的磁控溅射装置。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
Raman spectrometer and atom force microscope were employed to study and determine the structure and characteristics of the films prepared by the method of magnetron sputtering with graphite target.
用激光拉曼谱和原子力显微镜等现代分析手段研究了磁控溅射石墨靶制备的薄膜的结构和特性。
The technology of magnetron sputtering is an important method of preparing new materials in modern times, especially in the process of preparation of films.
磁控溅射技术是现代材料制备的重要方法之一，特别是在薄膜的制备过程中显得更为重要。
Magnetron sputtering is common method for preparating metal film resistor. by this method, the target is very important for the performance of the resistor.
在金属膜电阻器的生产过程中，靶材是非常关键的，它制约著金属膜电阻器的精度、可靠性、 电阻温度系数等性能。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
High resistance AZO films are fabricated on quartz substrates by radiofrequency (RF) magnetron sputtering deposition method in the environment with high oxygen proportion.
在石英衬底上采用射频磁控溅射的方法制备高电阻azo薄膜，其中高电阻由高氧氩比环境得到。
A magnetron sputtering apparatus and a method for manufacturing thin film are provided.
提供了一种磁控溅射设备和薄膜制造方法。
A magnetron sputtering apparatus and a method for manufacturing thin film are provided.
提供了一种磁控溅射设备和薄膜制造方法。
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