利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。

Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.

youdao

利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。

Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.

youdao