E-beam lithography machine 电子束曝光机
e beam lithography machine 电子束曝光机
Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron - beam Lithography Machine.
正在研制的激光定位吊装结构工作台系统是电子束曝光机的主要组成部分。
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