关键词 : AlN 薄膜 ; 直流磁控反应溅射 ; 择优取向 ; 半高宽 [gap=7499]Key words : AlN thin film ; DC magnetron reactive sputtering ; preferential orientation ; FWHM
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DC magnetron reactive sputtering process 直流反应磁控溅射
dc magnetron reactive sputtering technique 直流磁控反应溅射法
DC reactive magnetron sputtering 直流反应磁控溅射 ; 直流磁控溅射
The effect on the electrical and optical properties is studied as ITO transparent conductive thin films prepared by DC magnetron reactive sputtering technique with different deposition parameters.
论述了高温直流磁控反应溅射法制备ito透明导电薄膜时氧分压、溅射气压和溅射电流等参数对其光电特性的影响。
In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
本文采用直流反应磁控溅射工艺，以金属钨为靶材，在玻璃和单晶硅片上沉积了WO 3薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
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