关键词 : AlN 薄膜 ; 直流磁控反应溅射 ; 择优取向 ; 半高宽 [gap=7499]Key words : AlN thin film ; DC magnetron reactive sputtering ; preferential orientation ; FWHM
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DC magnetron reactive sputtering process 直流反应磁控溅射
dc magnetron reactive sputtering technique 直流磁控反应溅射法
DC reactive magnetron sputtering 直流反应磁控溅射
The effect on the electrical and optical properties is studied as ITO transparent conductive thin films prepared by DC magnetron reactive sputtering technique with different deposition parameters.
论述了高温直流磁控反应溅射法制备ito透明导电薄膜时氧分压、溅射气压和溅射电流等参数对其光电特性的影响。
In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
本文采用直流反应磁控溅射工艺，以金属钨为靶材，在玻璃和单晶硅片上沉积了WO 3薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
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