...粉末分散于无水乙醇溶 剂中，制备成含量为20% (质量分数)的浆料，并利 用“刮涂法”涂敷在铟掺杂氧化锡(indium-doped tin oxide ，ITO)– 聚萘二甲酸乙二醇酯(polyethylene naphthalate，PEN)导电聚合物基板上。
基于4个网页-相关网页
Tin-doped Indium Oxide 掺杂锡之铟氧化物
tin-doped indium oxide film 掺锡氧化铟薄膜
tin-doped indium oxide films 掺锡氧化铟薄膜
Zinc oxide thin films were prepared by pulsed laser deposition (PLD) on glass substrates coated with tin-doped indium oxide (ITO) thin films in this paper.
本文采用射频辅助脉冲激光沉积(PLD)系统，在镀有透明导电膜氧化锡铟(ito)的玻璃衬底上制备了氧化锌薄膜。
Tin doped indium oxide (ITO) films were deposited on glass substrates by reactive magnetron sputtering using a metallic alloy target (in Sn, 90 10).
采用铟锡合金靶(铟锡，90 - 10)，通过直流反应磁控溅射在玻璃基片上制备出ito薄膜，并在大气环境下高温退火处理。
应用推荐