... Film Preparation Equipment-薄膜制备设备 Magnetron Sputtering System-磁控溅射系统 Atomic layer deposition (ALD)-原子层沉积系统 ...
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Magnetron Sputtering System 磁控溅射系统 ; 磁控管溅镀系统
planar magnetron sputtering system 平面磁控管溅镀系统
ExB magnetron sputtering system 直交电磁场型溅镀系统
coxial magnetron sputtering system 同轴磁控管溅镀系统
JGP560C13 magnetron sputtering system JGP560C13型科研用超高真空多靶磁控溅射镀膜系统
dc magnetron sputtering system 直流磁控溅镀系统
unbalanced magnetron sputtering system 非平衡磁控溅射系统
facing-target magnetron sputtering system 对靶磁控溅射系统
Magnetron Sputtering Coating System 磁控溅射镀膜系统
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。
Diamond-like carbon DLC thin films were deposited onto si 100 and high speed steel substrates by mid-frequency magnetron sputtering system SP0806AS, Beijing Power tech Co.
采用SP0806AS中频磁控溅射镀膜机，在硅(100)和高速钢基体上，采用双石墨靶在不同功率下沉积了类金刚石薄膜。
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