It also shows that hardness increases with the increase of film thickness,substrate temperature and substrate bias.
随着Ar流量的增加(固定N2流量) 薄膜的硬度降低。 同时,随着膜厚的增加,基片温度的提高以及对基片施加的偏压的增高, 薄膜的硬度都有不同程度的提高。
参考来源 - 超硬薄膜CN·2,447,543篇论文数据,部分数据来源于NoteExpress
The model includes the substrate bias effect, the short channel effect and the relation between these two effects.
它综合考虑了衬偏效应、短沟道效应以及两者之间的关系。
The results showed that diffusion coefficient and diffusive distance increased with raising of negative substrate bias.
结果表明扩散系数和扩散距离都随着负衬底偏压的增大而增大。
And, with the enhancement of substrate bias voltage, electron energy increase gradually, electron density decrease sharply.
且随着基片偏压值的增大,电子能量有缓慢的增加,而电子密度则显著下降。
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