vacuum chemical vapor deposition 真空化学汽相淀积 chemical vapor deposition method 化学气相淀积工艺 ; 化学蒸汽沉积法 ; 化学蒸气沉淀法 ; 气相沉积法 ..
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Vacuum Chemical Vapor Deposition system 红外快速加热
Chemical Vapor Deposition Vacuum Chamber 化学气相沈积真空腔体
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
The technical advantages of vacuum plasma spray over conventional chemical vapor deposition(CVD) and air plasma spray in tungsten coating were also discussed.
和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比，低压等离子体喷涂具有明显的优势。
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