Titanium nitride thin film is deposited on Si(111) substrate by DC reactive magnetron sputtering.
采用直流反应磁控溅射方法在Si(111)基底上沉积了氮化钛薄膜。
参考来源 - 溅射气压对磁控溅射TiN薄膜光学性能的影响The results of this work are summarized as follow:1. We deposited ZnO films on different kinds of substrates by the method of RF magnetron sputtering.
主要研究工作和结论如下:1、采用射频反应磁控溅射的方法,在不同衬底上制备了ZnO薄膜。
参考来源 - ZnO薄膜的制备及其特性研究·2,447,543篇论文数据,部分数据来源于NoteExpress
All samples were prepared by rf magnetron sputtering method.
所有样品采用射频辅助磁控溅射方法制备。
Magnetron sputtering has become one of the most important methods for depositing thin films.
磁控溅射已经成为沉积薄膜的最重要的方法之一。
The power supply will be convenient for controlling the magnetron sputtering coater automatically.
该电源为磁控溅射镀膜设备实现自动控制提供了方便。
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