尤其是可依靠提高射频激励增加离化率,优化薄膜沉积过程溅射离子镀 (sputtering ion plating)是在溅射沉积法的基础上，在基片上施加偏压，并可通入反应气体， 形成薄膜的方法。
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magnetron sputtering ion plating 磁控溅射离子镀
reaction magnetron sputtering ion plating 反应磁控溅射离子镀
magnetron sputtering ion plating technology 磁控溅射离子镀
high-energy magnetron sputtering ion plating 高能级磁控溅射离子镀
The magnetron-sputtering ion plating aluminum film is not simply an out- covering layer of a single substance, but an alloy film containing both aluminum and copper.
磁控溅射离子镀铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。
Its structure and character were reviewed, and the synthetic methods, including CVD, ion beam sputtering, laser ablation, ion plating and ion irradiation et al., were completely introduced.
目前主要采用化学气相沉积法、离子束溅射法、激光等离子体沉积和激光烧蚀、离子镀、离子注入法等制备方法。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
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