Aiming at the lost accuracy happened in HEL (hot embossing lithography) because of thermal distortion, room-temperature imprint lithography is proposed.
针对热压印光刻工艺中因热变形而导致精度丧失的问题，提出了冷压印光刻。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要，开发了一套基于视频图像对正原理的压印光刻对准系统。
The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.
采用电子束直写、步进制模、压印翻制的压印模具生产工艺，其模具的制造是目前面临的难点。
The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.
采用电子束直写、步进制模、压印翻制的压印模具生产工艺，其模具的制造是目前面临的难点。
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