文章详细信息 关键词: 压印光刻;;高保真度;;模具;;压印工艺;;热误差 [gap=675]Keywords: imprint lithography;high-conformity;mold;imprint process;thermal error
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此外,压印微影(imprint lithography )技术也可以解决晶片体积压缩的问题。 在传统的光刻工艺当中,一束镭射用来雕刻硅片上的一道沟槽,而后,这些沟槽会经过化学物...
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...泛关注,并于2003年底被国际半导体技术蓝图机构列为32 nm 以下节点光刻制造的备选技术之二. 压印光刻技术(Imprint Lithography)最早由美国明尼苏达大学于20世纪90年代中期提出睁7],该技术将具有纳米图案的模板以机械力在涂布高分子光刻胶的硅基板上等比例(1...
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Roller imprint lithography 印技术
Step and Flash Imprint Lithography 步进快闪式压印微影 ; 闪光压印技术 ; 纳米压印
self-aligned imprint lithography 的自对准压印光刻技术
Substrate Conformal Imprint Lithography 基板完整压印光刻
ultraviolet imprint lithography 紫外压印
hot embossing imprint lithography 热压雕版压印法
Aiming at the lost accuracy happened in HEL (hot embossing lithography) because of thermal distortion, room-temperature imprint lithography is proposed.
针对热压印光刻工艺中因热变形而导致精度丧失的问题,提出了冷压印光刻。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要,开发了一套基于视频图像对正原理的压印光刻对准系统。
The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.
采用电子束直写、步进制模、压印翻制的压印模具生产工艺,其模具的制造是目前面临的难点。
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