...直流反应磁控溅射；溅射功率；减反射薄膜；光学特性[gap=1035]Key words: titanium dioxide; DC reactive magnetron sputtering; sputtering power; antireflection; optical property..
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... 常压化学气相沉积(APCVD) 直流磁控溅射(DC reactive magnetron sputtering) 微波电子回旋共振化学气相沉积(MWECR-CVD) ...
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dc reactive magnetron sputtering method 直流磁控溅射法
dc reactive magnetron sputtering technique 直流反应磁控溅射法
DC magnetron reactive sputtering 直流磁控反应溅射
Ultrathin aluminum films were prepared by DC reactive magnetron sputtering. The target was made by 99.999% pure aluminum.
采用直流磁控溅射法溅射纯度为99.999%的铝靶制备了超薄铝膜。
TiOx thin films at the conditions of different depositing temperatures were on prepared on glass substrates by DC reactive magnetron sputtering.
通过磁控反应溅射，在玻璃基底上制备了不同溅射温度下的氧化钛薄膜。
In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
本文采用直流反应磁控溅射工艺，以金属钨为靶材，在玻璃和单晶硅片上沉积了WO 3薄膜。
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