... ion sputter etching 溅射刻蚀 ion beam etching 离子束腐蚀 ; 离子束蚀刻 ion bombardment etching 离子轰击浸蚀 ...
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ion beam etching system 离子束蚀刻系统 ; 离子束刻蚀系统
ion-beam etching 离子束刻蚀
ar ion beam etching 氩离子束刻蚀
ion beam etching rate 离子束刻蚀速率
argon ion beam etching 氩离子束刻蚀
Ion Beam Etching system- 离子束刻蚀系统
reactive ion-beam etching 反应离子束刻蚀
Ion Beam Etching Cleaning 离子束刻蚀清洗
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
使用薄膜沉积法和离子束刻蚀法制作16阶菲涅耳透镜，应用于折衍混合CCD相机。
The gated silicon field emitter arrays (FEA) with small gate aperture have been successfully fabricated by dry etching, including ion beam etching (IBE) and reactive ion etching (RIE).
利用离子束刻蚀(IBE)和反应离子刻蚀(RIE)等干法刻蚀方法来制造带栅极的场发射阴极阵列。
Abstract : Ion beam etching technologies for developing large aperture Diffractive Optical Elements (DOEs) were reviewed.
摘要 ： 总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展。
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